Cleaning for the removal of burr contamination from automotive press parts.
Contamination removal was achieved with the same effect as ultra-mirror polishing of the wafer.
There was an inquiry regarding the removal of contamination from press-cut products. The issue was that the contamination generated during the deburring process was strongly adhered to the products, and some of it could not be removed even after passing through a cleaning device. It was mentioned that a neutral detergent was being used, so a small OK nozzle OKE-MB07FJ (20L/min) was employed. The cleaning solution containing neutral detergent in the 500L tank was initially cloudy, making it difficult to determine the generation of microbubbles. Therefore, experiments were conducted by varying the air suction volume, and the optimal suction volume for cleaning was selected, resulting in the same effect as during the ultra-polishing of wafers. In this cleaning process as well, microbubbles burst due to showering and brushing, and it seems that the destructive power of these bubbles enabled effective peeling cleaning. The method for generating microbubbles involves using a submersible pump within the 500L tank. For more details, please contact us or refer to the catalog.
- Company：OKエンジニアリング
- Price：Other
